Reported here is the continuation of the structure characterization of
carbon thin films produced by a pulsed vacuum are plasma source. Hydr
ogen free carbon films with thickness up to 3 mu m were prepared with
average deposition rate of 5 mu m/h onto various substrates. It was fo
und that these carbon films are not quite amorphous and can be describ
ed by modelling the clustered structure with different sp(3)/sp(2)/sp
bond ratios depending on deposition conditions. Results of the experim
ental investigations and numerical modelling of the films structure ar
e presented.