STRUCTURE MODELING OF DLC-FILMS FORMED BY PULSED-ARC METHOD

Reported here is the continuation of the structure characterization of carbon thin films produced by a pulsed vacuum are plasma source. Hydr ogen free carbon films with thickness up to 3 mu m were prepared with average deposition rate of 5 mu m/h onto various substrates. It was fo und that these carbon films are not quite amorphous and can be describ ed by modelling the clustered structure with different sp(3)/sp(2)/sp bond ratios depending on deposition conditions. Results of the experim ental investigations and numerical modelling of the films structure ar e presented.