70-NM-PITCH PATTERNING ON CAF2 BY E-BEAM EXPOSURE

Authors
HONGO H HATTORI T MIYAMOTO Y FURUYA K MATSUNUMA T WATANABE M ASADA M
Citation
H. Hongo et al., 70-NM-PITCH PATTERNING ON CAF2 BY E-BEAM EXPOSURE, JPN J A P 1, 35(12A), 1996, pp. 6342-6343
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS → ACNP
Volume
35
Issue
12A
Year of publication
1996
Pages
6342 - 6343
Database
ISI
Abstract
We report fine pitch patterns of polycrystalline CaF2 film deposited o n an InP substrate formed by e-beam exposure. Ten periods of 70-nm-pit ch line patterns were fabricated. The linewidth fluctuation was found to depend on the grain size of the CaF2 film.