An. Cartwright et al., SCALING OF STARK-SHIFTED PER-CARRIER NONLINEARITIES IN MULTIPLE-QUANTUM-WELL DEVICE STRUCTURES, IEEE journal of quantum electronics, 31(10), 1995, pp. 1726-1733
We demonstrate simple rules for the scaling of per-carrier Stark-shift
ed nonlinearities with well number, electric field, amplitude and widt
h of the excitonic transition by measuring the per carrier nonlinear r
esponse of a number of multiple-quantum-well structures as a function
of temperature, bias and materials system. These measurements illustra
te that the per-carrier nonlinearity can be improved by optimizing the
in-well bias field and by increasing the number of wells per intrinsi
c region; however, they also demonstrate that when the measured per-ca
rrier nonlinearities are corrected for material quality and temperatur
e (i.e., excitonic amplitude and linewidth) that the per-carrier respo
nse does not depend appreciably on material system or on whether the f
ields are externally-applied, built-in, or intrinsic.