SIMULATION OF 2-DIMENSIONAL PHOTORESIST ETCHING PROCESS IN INTEGRATED-CIRCUIT FABRICATION USING CELLULAR-AUTOMATA

Authors
KARAFYLLIDIS I THANAILAKIS A
Citation
I. Karafyllidis et A. Thanailakis, SIMULATION OF 2-DIMENSIONAL PHOTORESIST ETCHING PROCESS IN INTEGRATED-CIRCUIT FABRICATION USING CELLULAR-AUTOMATA, Modelling and simulation in materials science and engineering, 3(5), 1995, pp. 629-642
Citations number
21
Categorie Soggetti
Material Science","Physics, Applied
Journal title
Modelling and simulation in materials science and engineering → ACNP
ISSN journal
09650393
Volume
3
Issue
5
Year of publication
1995
Pages
629 - 642
Database
ISI
SICI code
0965-0393(1995)3:5<629:SO2PEP>2.0.ZU;2-2
Abstract
A new algorithm for the simulation of photoresist etching, based on ce llular automata, is presented in this paper. The algorithm is fast and robust and has been successfully tested using all known etch-rate dis tribution test functions. The algorithm performs very well, even in ar eas where the fluctuation in etch rates is wide and sharp.