PHYSICAL-PROPERTIES OF PULSED CURRENT COPPER ELECTRODEPOSITS

Citation
Mr. Kalantary et Dr. Gabe, PHYSICAL-PROPERTIES OF PULSED CURRENT COPPER ELECTRODEPOSITS, Journal of Materials Science, 30(18), 1995, pp. 4515-4522
Citations number
26
Categorie Soggetti
Material Science
ISSN journal
00222461
Volume
30
Issue
18
Year of publication
1995
Pages
4515 - 4522
Database
ISI
SICI code
0022-2461(1995)30:18<4515:POPCCE>2.0.ZU;2-#
Abstract
Square-wave unipolar pulse electroplating and bipolar pulse reverse el ectroplating of copper using an acid copper electrolyte of the type us ed for printed circuit boa rd production has been studied. The effects of pulse-plated coatings on cathode efficiency and on the coatings pr operties, such as surface roughness, microhardness, stress-strain char acteristics and elongation, are reported. The results show that microh ardness, tensile strength and elongation are directly affected by the pulse technique used.