INFRARED MICROSCOPY STUDIES ON HIGH-POWER INGAAS-GAAS-INGAP LASERS WITH GA2O3 FACET COATINGS

Citation
M. Passlack et al., INFRARED MICROSCOPY STUDIES ON HIGH-POWER INGAAS-GAAS-INGAP LASERS WITH GA2O3 FACET COATINGS, IEEE journal of selected topics in quantum electronics, 1(2), 1995, pp. 110-116
Citations number
47
Categorie Soggetti
Engineering, Eletrical & Electronic",Optics
ISSN journal
1077260X
Volume
1
Issue
2
Year of publication
1995
Pages
110 - 116
Database
ISI
SICI code
1077-260X(1995)1:2<110:IMSOHI>2.0.ZU;2-I
Abstract
InGaAs-GaAs separate confinement, heterostructure single quantum-well (SCH-SQW) lasers (lambda = 0.98 mu m) with lattice-matched InGaP cladd ing layers, using a new Ga2O3 low reflectivity (LR) front-facet coatin g, are reported. The CW peak power density (17 MW/cm(2)) of 6 mu m x 7 50 mu m ridge-waveguide lasers is limited by thermal rollover, and rep eated cycling beyond thermal rollover produced no change in operating characteristics. The high-power temperature distribution along the act ive stripe has been measured by high-resolution infrared (3-5 mu m) im aging microscopy. The temperature profile acquired for a very high opt ical power density P-D = 11 MW/cm(2) was found to be uniform along the inner active laser stripe, and revealed a local temperature increase at the LR front facet Delta T-f of only 9 K above the average stripe t emperature Delta T-s = 24 K, An excellent front-facet interface recomb ination velocity < 10(5) cm/s has been inferred from the measured low local temperature rise in the front facet.