MODEL OF ETCHING PROFILES FOR ION ENERGY FLUX DEPENDENT ETCH RATES INA COLLISIONLESS PLASMA SHEATH (VOL 77, PG 3445, 1995)

Authors
ABRAHAMSHRAUNER B WANG CDD
Citation
B. Abrahamshrauner et Cdd. Wang, MODEL OF ETCHING PROFILES FOR ION ENERGY FLUX DEPENDENT ETCH RATES INA COLLISIONLESS PLASMA SHEATH (VOL 77, PG 3445, 1995), Journal of applied physics, 78(7), 1995, pp. 4813-4813
Citations number
1
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
78
Issue
7
Year of publication
1995
Pages
4813 - 4813
Database
ISI
SICI code
0021-8979(1995)78:7<4813:MOEPFI>2.0.ZU;2-K