FREQUENCY-EFFECTS IN CAPACITIVELY COUPLED RADIOFREQUENCY GLOW-DISCHARGES - A COMPARISON BETWEEN A 2-D FLUID MODEL AND EXPERIMENTS

Citation
Wj. Goedheer et al., FREQUENCY-EFFECTS IN CAPACITIVELY COUPLED RADIOFREQUENCY GLOW-DISCHARGES - A COMPARISON BETWEEN A 2-D FLUID MODEL AND EXPERIMENTS, IEEE transactions on plasma science, 23(4), 1995, pp. 644-649
Citations number
18
Categorie Soggetti
Phsycs, Fluid & Plasmas
ISSN journal
00933813
Volume
23
Issue
4
Year of publication
1995
Pages
644 - 649
Database
ISI
SICI code
0093-3813(1995)23:4<644:FICCRG>2.0.ZU;2-4
Abstract
The results of a 2-D fluid model for argon radiofrequency (RF) dischar ges in a closed cylindrical vacuum chamber are compared with experimen tal data from an amorphous silicon deposition reactor operated in argo n. Good agreement is obtained for the relation between the DC autobias voltage and the dissipated power in the frequency range 40-100 MHz at pressures between 10 and 60 Pa. Scaling laws are presented for the di ssipated power and for the ion fluxes toward the electrodes. These qua ntities are expressed in the DC bias voltage, the RF excitation freque ncy and the background pressure, Also the uniformity of the ion fluxes is studied. The model yields a linear relation between the applied RF voltage and the DC bias voltage. This relation depends only on the ge ometry of the discharge chamber and shows an offset.