Wj. Goedheer et al., FREQUENCY-EFFECTS IN CAPACITIVELY COUPLED RADIOFREQUENCY GLOW-DISCHARGES - A COMPARISON BETWEEN A 2-D FLUID MODEL AND EXPERIMENTS, IEEE transactions on plasma science, 23(4), 1995, pp. 644-649
The results of a 2-D fluid model for argon radiofrequency (RF) dischar
ges in a closed cylindrical vacuum chamber are compared with experimen
tal data from an amorphous silicon deposition reactor operated in argo
n. Good agreement is obtained for the relation between the DC autobias
voltage and the dissipated power in the frequency range 40-100 MHz at
pressures between 10 and 60 Pa. Scaling laws are presented for the di
ssipated power and for the ion fluxes toward the electrodes. These qua
ntities are expressed in the DC bias voltage, the RF excitation freque
ncy and the background pressure, Also the uniformity of the ion fluxes
is studied. The model yields a linear relation between the applied RF
voltage and the DC bias voltage. This relation depends only on the ge
ometry of the discharge chamber and shows an offset.