EMERGENCE OF BASIC SITES ON A SI(111) SURFACE IN THE INITIAL-STAGE OFOXIDATION IN WATER

Citation
Yc. Sasaki et M. Mitsuya, EMERGENCE OF BASIC SITES ON A SI(111) SURFACE IN THE INITIAL-STAGE OFOXIDATION IN WATER, Langmuir, 11(9), 1995, pp. 3446-3449
Citations number
24
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
07437463
Volume
11
Issue
9
Year of publication
1995
Pages
3446 - 3449
Database
ISI
SICI code
0743-7463(1995)11:9<3446:EOBSOA>2.0.ZU;2-#
Abstract
The surface oxidation of hydrogen-terminated Si(111) single crystals i n water has been studied by the adsorption of adenosinetriphosphate an d chlorine from their aqueous solutions. The radioactive tracer (P-32) method and Auger electron spectroscopy have revealed that these anion s are chemisorbed on the Si surface before the surface is fully oxidiz ed. The results indicate that the silicon surface is positively charge d in nearly neutral solutions, and is suggestive of the emergence of b asic sites in the initial oxidation stage. Structural change of the su rface-oxidized layer has been discussed in relation to the oxidation o f a clean silicon surface under low oxygen pressure in a vacuum.