An analysis by Anger electron spectroscopy has allowed the characteriz
ation of Ta/Ta2O5, Ta2O5/MnO2 interfaces in a tantalum capacitor. This
analysis was carried out systematically on samples collected during t
he various fabrication phases of the capacitor. Spectra have been reco
rded on each sample, before and after cleaning by ion bombardment, at
room temperature, and after different sputtering times. The peaks obta
ined during this study are those of tantalum, carbon, oxygen, manganes
e, phosphorus, argon and nitrogen. Oxygen and carbon are always presen
t, even after sputtering. At the Ta2O5/MnO2 interface, the amount of c
arbon is very large. The normalized peak heights as a function of temp
erature show that there is a significant emergence of impurities at th
e anode surface.