K. Yoshimoto et al., PREPARATION OF CUTI-CN(3)TI COMPOUND ALLOY-FILMS AND THEIR APPLICATIONS AS DIFFUSION BARRIER IN CU CUTI-CU3TI/TIN/SI MULTILAYERED CONTACT SYSTEM/, Electronics & communications in Japan. Part 2, Electronics, 79(8), 1996, pp. 49-56
The CuTi2 intermediate layer in a Cu/CuTi2/Ti/Si multilayered contact
system disappears when heat-treated at a temperature higher than 500 d
egrees C. Thus, to improve the thermal stability of a Cu/CuTi2/Ti/Si m
ultilayered contact system, it is necessary to replace the CuTi2 layer
with other Cu-Ti compounds that are thermally stable at temperatures
higher than 500 degrees C. Among various Cu-Ti compounds, Cu3Ti is the
most stable compound formed by heat-treating the Cu/Ti bilayered syst
em. However, since it is difficult to form a monolithic layer of Cu3Ti
intermetallic compound, Cu-Ti alloy systems which contain Cu,Ti and c
an be formed at relatively low temperature were investigated. The CuTi
-Cu3Ti compound alloy films were formed when the Cu/Ti bilayers were h
eat treated at 350 degrees C for four hours. Thus, the thermal stabili
ty of a Cu/CuTi-Cu3Ti/TiN/Si contact system was investigated. The expe
rimental results indicate that the top layer of Cu can be preserved ev
en when heated at 600 degrees C and the interdiffusion between Cu and
Si can be minimized.