Mechanisms for influencing the operation parameters of a microwave gas
discharge in a magnetic field on the internal plasma parameters of th
e discharge are studied analytically and numerically. This influence o
ccurs through a specific electric field E/p, whose absolute value and
range of variation are shown to depend on the plasma generation parame
ters (in particular, on the external magnetic field configuration) and
can be considerably greater than those obtained in the positive colum
n of a de glowing discharge. Due to this, a microwave plasma in a magn
etic field is one of the most promising vacuum-plasma methods for low-
energy-consumption and highly selective treatment of materials used in
microelectronics.