K. Hoshino et al., IMPROVEMENT IN JUNCTION PROPERTIES OF A N-SI POLY(3-METHYLTHIOPHENE) RETEROJUNCTION BY POSTTREATMENT WITH AQHF/, JPN J A P 2, 34(9B), 1995, pp. 1241-1243
Junction properties of an n-Si/poly(3-methylthiophene) (P3MeT) cell ar
e investigated by current-voltage measurements. Efforts have been made
to understand and improve the inorganic/organic interface. It was fou
nd that a great improvement in junction properties is possible by trea
ting the cell with an aq. HF solution. Since electrical conductivity o
f P3MeT bulk is little affected by the HF treatment, the improvement i
s attributed to the enhancement in interactions between P3MeT and n-Si
. The cell showed degradation upon exposure to air, but it recovered i
ts original characteristics when it was again treated with an aq.HF so
lution.