ANNEALING TEMPERATURE-DEPENDENCE OF MGO SUBSTRATES ON THE QUALITY OF YBA2CU3OX FILMS PREPARED BY PULSED-LASER ABLATION
Citation
T. Minamikawa et al., ANNEALING TEMPERATURE-DEPENDENCE OF MGO SUBSTRATES ON THE QUALITY OF YBA2CU3OX FILMS PREPARED BY PULSED-LASER ABLATION, JPN J A P 1, 34(8A), 1995, pp. 4038-4042
Categorie Soggetti
Physics, Applied
Abstract
The effect of annealing on a MgO substrate was systematically investig
ated, varying the annealing temperature, for preparation of high-quali
ty YBa2Cu3Ox (YBCO) films by pulsed laser ablation. X-ray photoelectro
n spectroscopy (XPS) and atomic force microscopy (AFM) were carried ou
t for characterization of the MgO substrate and X-ray diffraction (XRD
) measurement, including theta-2 theta scan, omega-scan (rocking curve
) and phi-scan, and electrical measurement were carried out for charac
terization of YBCO films. Thermal annealing of MgO above 1000 degrees
C in oxygen ambient was found to give rise to a great improvement of t
he crystallinity and the reproducibility of crystal orientation of YBC
O films, while it was also found to induce Ca segregation on the surfa
ce of MgO and reduce the oxygen content of YBCO films. Annealing below
1000 degrees C causes no outstanding improvement in the crystal struc
ture of YBCO. On the MgO substrate annealed at 1200 degrees C c-axis-o
riented YBCO film was found to reproducibly show a full width at half-
maximum (FWHM) of the rocking curve of 0.3 degrees, an FWHM of (005) d
iffraction of 0.1 degrees, an epitaxial relation without in-plane miso
rientation, a critical zero temperature of 89 K, and a critical curren
t density of 10(6) A/cm(2) at 77.4 K and zero field.