SIMULATION AND PROCESS DESIGN OF GRAY-TONE LITHOGRAPHY FOR THE FABRICATION OF ARBITRARILY-SHAPED SURFACES

This paper reports on a study of a methodology for fabrication of arbi trarily shaped silicon structures using technologies common to standar d IC manufacturing processes. Particular emphasis is placed on the des ign and use of halftone transmission masks for the lithography step re quired in the fabrication process of mechanical, optical or electronic s components. The design and experimental investigation of gray-tone m asks were supported by lithography simulation. Results are presented f or both simulated gray-tone patterns and experimental trials.