The influence of the face polarity of the seed crystal on the alpha-Si
C sublimation growth has been investigated. Optical and electrical mea
surements were carried out for undoped and nitrogen-doped crystals gro
wn on the (000 $$($) over bar 1)C and the (0001)Si faces. The undoped
crystal grown on the (000 $$($) over bar 1)C face showed n-type conduc
tion and high optical transmittance in the visible light region. In co
ntract, the undoped crystal grown on the (0001)Si face was highly resi
stive p-type. It was dark in color and showed low optical transmittanc
e. The differences between the two crystals are explained in terms of
impurity incorporation during growth, which has different kinetics on
the (000 $$($) over bar 1)C and the (0001)Si faces.