PROCESSING STRATEGY FOR PRODUCING HIGHLY ANISOTROPIC SILICON-NITRIDE

Citation
K. Hirao et al., PROCESSING STRATEGY FOR PRODUCING HIGHLY ANISOTROPIC SILICON-NITRIDE, Journal of the American Ceramic Society, 78(6), 1995, pp. 1687-1690
Citations number
20
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00027820
Volume
78
Issue
6
Year of publication
1995
Pages
1687 - 1690
Database
ISI
SICI code
0002-7820(1995)78:6<1687:PSFPHA>2.0.ZU;2-J
Abstract
Silicon nitride with a preferred orientation of large elongated grains was obtained by tape casting of raw powder slurry seeded with rodlike beta-Si3N4 particles, followed by a gas pressure sintering under 1 MP a nitrogen pressure. The large elongated grains developed from seeds l ay in planes parallel to the casting direction in a two-dimensional di stribution. Increased fracture toughness (11.1 MPa . m(1/2)) and bendi ng strength (1100 MPa) were achieved in the direction perpendicular to the grains alignment compared to specimens with a random distribution of elongated grains. Moreover, the specimens exhibited a high Weibull modulus of 46 due to the uniform distribution of large grains.