HIGH T-C STEP-EDGE JOSEPHSON-JUNCTIONS ON SILICON SUBSTRATES

Citation
S. Linzen et al., HIGH T-C STEP-EDGE JOSEPHSON-JUNCTIONS ON SILICON SUBSTRATES, Applied physics letters, 67(15), 1995, pp. 2235-2237
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
67
Issue
15
Year of publication
1995
Pages
2235 - 2237
Database
ISI
SICI code
0003-6951(1995)67:15<2235:HTSJOS>2.0.ZU;2-6
Abstract
The epitaxial buffer system CeO2/YSZ was used to prepare YBCO films of high crystalline quality on silicon substrates by laser deposition. A n advanced technique of step preparation in the YSZ buffer layer prese rved the critical current densities of j(C) (77 K)similar to 10(6) A/c m(2) for 30 nm thick YBCO films also in the etched parts of the substr ate. Further, a homogeneous growth over the 35 to 45 nm deep steps was observed. So we were able to realize step-edge Josephson junctions wi th critical temperatures up to 77 K. Our dc SQUIDs on silicon substrat es showed voltage modulation 74 K. (C) 1995 American Institute of Phys ics.