ORGANIC MOLECULAR-BEAM DEPOSITION OF HIGHLY NONLINEAR-OPTICAL 4'-NITROBENZYLIDENE-3-ACETAMINO-4-METHOXY-ANILINE

Thin films of the nonlinear optical material 4'-nitrobenzylidene-3-ace tamino-4-methoxy-aniline have been prepared using the organic molecula r beam deposition technique. High quality homoepitaxial layers have be en grown at substrate temperatures of 80 degrees C and moderate growth rates of 0.1-0.5 Angstrom/s. The samples have been characterized by o ptical polarization and interference microscopy as well as atomic forc e microscopy. Growth experiments on inorganic substrates, including si licon and glass, have been performed in a substrate temperature range of -190 to 100 degrees C and led to amorphous films at low temperature s and polycrystalline films at temperatures above 50 degrees C. (C) 19 95 American Institute of Physics.