DISSOCIATION KINETICS OF HYDROGEN-PASSIVATED (100)SI SIO2 INTERFACE DEFECTS (VOL 77, PG 6205, 1995)/

Authors
STATHIS JH
Citation
Jh. Stathis, DISSOCIATION KINETICS OF HYDROGEN-PASSIVATED (100)SI SIO2 INTERFACE DEFECTS (VOL 77, PG 6205, 1995)/, Journal of applied physics, 78(8), 1995, pp. 5215-5215
Citations number
1
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
78
Issue
8
Year of publication
1995
Pages
5215 - 5215
Database
ISI
SICI code
0021-8979(1995)78:8<5215:DKOH(S>2.0.ZU;2-2