OSTWALD RIPENING OF VACANCY ISLANDS AT THIOL COVERED AU(111)

Citation
O. Cavalleri et al., OSTWALD RIPENING OF VACANCY ISLANDS AT THIOL COVERED AU(111), Surface science, 340(1-2), 1995, pp. 960-964
Citations number
13
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
340
Issue
1-2
Year of publication
1995
Pages
960 - 964
Database
ISI
SICI code
0039-6028(1995)340:1-2<960:OROVIA>2.0.ZU;2-V
Abstract
The growth kinetics of vacancy islands at a Au(111) surface covered wi th self-assembled thiol monolayers has been investigated by in-situ sc anning tunneling microscopy. The vacancy islands are found to coarsen by Ostwald ripening. The exponent characterizing the power-law time de pendence of the coarsening is found to be n approximate to 1/2 indepen dent of the thiol chain length (CH3(CH2)(x)SH, x = 5, 9, 17). This beh avior is consistent with a model in which the mass transport is limite d by the adsorption/desorption rate of vacancies at the hole edges.