Ar. Avery et al., THE LOCATION OF SILICON ATOMS AND THE INITIAL-STAGES OF FORMATION OF THE SI GAAS(001) INTERFACE STUDIED BY STM/, Surface science, 340(1-2), 1995, pp. 57-70
Scanning tunnelling microscopy (STM) and reflection high energy electr
on diffraction (RHEED) have been used to study the deposition of Si at
560 degrees C in the presence of an arsenic flux on GaAs(001)-(2 X 4)
surfaces grown in situ by molecular beam epitaxy (MBE). RHEED studies
indicate that for the low Si deposition rates used, the surface struc
ture undergoes a series of changes as the Si coverage is increased up
to 2.5 monolayers; (2 X 4) --> asymmetric (3 X 1) --> symmetric (3 X 1
) --> (3 X 2) --> (4 X 2). At low coverages, the Si preferentially occ
upies vacant second layer Ga sites in the missing dimer trenches of th
e (2 x 4) reconstructed clean surface and a disordered, kinked surface
is formed. Adjacent Si atoms in the trenches are eventually covered w
ith As, bridging the missing dimer trenches and forming elongated rect
angular units with a periodicity along [<(1)over bar 10>] of Angstrom.
The number of these units becomes greater as the Si coverage is incre
ased and there is a change in periodicity from 8 to 12 Angstrom along
[<(1)over bar 10>] consistent with the appearance of the symmetric (3
X 1) structure. Detailed studies on vicinal surfaces misoriented by 1
degrees towards both (111)A and (111)B indicate no preference for the
Si to align itself along the step edges. As the Si coverage is increas
ed, the Si displaces Ga atoms from the second layer of the structure a
nd forms a series of two dimensional islands which appear as ''holes''
in the surface. These islands eventually dominate the surface and res
ult in a terminating Si layer and the observation of the (3 x 2) struc
ture. Subsequent Si growth occurs by dimer chain formation on top of t
his layer and the strings of Si dimers that are formed at high coverag
es are characteristic of STM observations of the homoepitaxial growth
of Si on Si(001).