CARBON CONTAMINATION IN SYNCHROTRON-RADIATION-STIMULATED AL DEPOSITION USING A LOW-TEMPERATURE CONDENSED LAYER OF DIMETHYL ALUMINUM-HYDRIDE

The carbon contamination in photochemically deposited Al films fabrica ted using non-monochromatized synchrotron radiation (SR) and Mg K-alph a line (1253.6 eV) irradiation were compared by X-ray photoelectron sp ectroscopy (XPS) analysis. The excitation energy dependence of the car bon contamination, especially the effects of core electron excitations . in the photo-CVD of Al using a low-temperature condensed layer of di methyl aluminum hydride was determined using XPS spectra and gas-phase photo absorption cross section spectra. A significant decrease of the carbon contaminations was observed in the films fabricated using SR i rradiation, which can excite Al 2s and Al 2p core electrons as welt as the valence electrons, while no change was observed in the films fabr icated using hg K-alpha line irradiation. This is explained by the fac t that core electron excitation breaks the Al-C bonds site-specificall y.