The method of submonolayer migration-enhanced epitaxy was proposed and
implemented for the first time on the EP1203 molecular-beam epitaxy s
etup. The method was used to obtain InAs quantum dots on the singular
and vicinal (100) surfaces of GaAs. Our results show that the method o
f submonolayer migration-enhanced epitaxy is promising for producing h
ighly uniform arrays of quantum dots with low size dispersion. (C) 199
5 American Institute of Physics.