PHOSPHORIC-ACID PASSIVATED NIOBIUM AND TANTALUM EIS-COMPARATIVE STUDY

Citation
Fm. Alkharafi et Wa. Badawy, PHOSPHORIC-ACID PASSIVATED NIOBIUM AND TANTALUM EIS-COMPARATIVE STUDY, Electrochimica acta, 40(16), 1995, pp. 2623-2626
Citations number
31
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
00134686
Volume
40
Issue
16
Year of publication
1995
Pages
2623 - 2626
Database
ISI
SICI code
0013-4686(1995)40:16<2623:PPNATE>2.0.ZU;2-A
Abstract
Many investigations concerning oxide him growth on niobium and tantalu m in aqueous solutions have been conducted. Recent work has shown that the corrosion and passivation behavior of valve metals has no standar d case, it depends greatly on the ambient electrolyte. Electrochemical impedance spectroscopy (EIS) was used to obtain detailed information about the difference in behavior of passive films formed on niobium an d tantalum under the same conditions. Comparison of the behavior of th e two systems Nb-oxide-electrolyte and Ta-oxide-electrolyte showed tha t the passive films formed on niobium in phosphoric acid solutions do not behave as perfect dielectric like those formed on Ta under the sam e conditions. The Nb-oxide-electrolyte system cannot be represented by a simple equivalent circuit whereas the Ta-oxide-electrolyte system c an be.