Many investigations concerning oxide him growth on niobium and tantalu
m in aqueous solutions have been conducted. Recent work has shown that
the corrosion and passivation behavior of valve metals has no standar
d case, it depends greatly on the ambient electrolyte. Electrochemical
impedance spectroscopy (EIS) was used to obtain detailed information
about the difference in behavior of passive films formed on niobium an
d tantalum under the same conditions. Comparison of the behavior of th
e two systems Nb-oxide-electrolyte and Ta-oxide-electrolyte showed tha
t the passive films formed on niobium in phosphoric acid solutions do
not behave as perfect dielectric like those formed on Ta under the sam
e conditions. The Nb-oxide-electrolyte system cannot be represented by
a simple equivalent circuit whereas the Ta-oxide-electrolyte system c
an be.