PERFORMANCE OF MICROSTRIP GAS-CHAMBERS PASSIVATED BY THIN SEMICONDUCTING GLASS AND PLASTIC FILMS

Citation
Mr. Bishai et al., PERFORMANCE OF MICROSTRIP GAS-CHAMBERS PASSIVATED BY THIN SEMICONDUCTING GLASS AND PLASTIC FILMS, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 365(1), 1995, pp. 54-58
Citations number
9
Categorie Soggetti
Nuclear Sciences & Tecnology","Physics, Particles & Fields","Instument & Instrumentation",Spectroscopy
ISSN journal
01689002
Volume
365
Issue
1
Year of publication
1995
Pages
54 - 58
Database
ISI
SICI code
0168-9002(1995)365:1<54:POMGPB>2.0.ZU;2-3
Abstract
Patterned microstrip gas chamber substrates have been covered with ion -beam sputtered glass with electronic conductivity or a polymer which was subsequently irradiated with an ion-beam. The sputtering procedure is described in detail. The performance of several detectors is repor ted.