P. Voumard et R. Zenobi, LASER-INDUCED THERMAL-DESORPTION OF ANILINE FROM SILICA SURFACES, The Journal of chemical physics, 103(15), 1995, pp. 6795-6805
A complete study on the energy partitioning upon laser-induced thermal
desorption of aniline from silica surfaces was undertaken. The measur
ements include characterization of the aniline-quartz adsorption syste
m using temperature-programmed desorption, the extrapolation of quasie
quilibrium desorption temperatures to the regime of laser heating rate
s on the order of 10(9)-10(10) K/s by computational means, measurement
of the kinetic energy distributions of desorbing aniline using a pump
-probe method, and the determination of internal energies with resonan
ce-enhanced multiphoton ionization spectroscopy. The measurements are
compared to calculations of the surface temperature rise and the resul
ting desorption rates, based on a finite-difference mathematical descr
iption of pulsed laser heating. While the surface temperature of laser
-heated silica reaches about 600-700 K at the time of desorption, the
translational temperature of laser-desorbed aniline was measured to be
T-kin=420+/-60 K, T-vib was 360+/-60 K, and T-rot was 350+/-100 K. Th
ese results are discussed using different models for laser-induced the
rmal desorption from surfaces. (C) 1995 American institute of Physics.