Cy. Hu et al., A CONVERGENCE SCHEME FOR OVER-ERASED FLASH EEPROMS USING SUBSTRATE-BIAS-ENHANCED HOT-ELECTRON INJECTION, IEEE electron device letters, 16(11), 1995, pp. 500-502
A novel convergence scheme using substrate-bias-enhanced hot electron
injection is proposed to tighten the cell threshold voltage distributi
on after erasure for stacked gate Flash EEPROM's, By lowering the drai
n voltage and increasing the magnitude of the negative substrate bias
voltage, the substrate current is reduced but the hot electron gate cu
rrent is enhanced significantly, and the convergence time is shown to
be more than a hundred times shorter than the previous scheme, With th
e convergence operation performed near the ON-OFF transition region of
the cells, the total drain current for all the converged cells is red
uced and low power consumption is achieved.