DEPOSITION AND CHARACTERIZATION OF ORGANOSILICON THIN-FILMS FROM TEOS-2 GAS-MIXTURE(O)

Authors
JANCA J NAVRATIL K BOCHNICEK Z PERINA V
Citation
J. Janca et al., DEPOSITION AND CHARACTERIZATION OF ORGANOSILICON THIN-FILMS FROM TEOS-2 GAS-MIXTURE(O), Czechoslovak journal of Physics, 45(10), 1995, pp. 851-862
Citations number
22
Categorie Soggetti
Physics
Journal title
Czechoslovak journal of Physics → ACNP
ISSN journal
00114626
Volume
45
Issue
10
Year of publication
1995
Pages
851 - 862
Database
ISI
SICI code
0011-4626(1995)45:10<851:DACOOT>2.0.ZU;2-O
Abstract
The composition of films deposited in RF glow discharge tubular reacto r fed with tetraethoxysilane (TEOS) and oxygen mixtures at various tem peratures, gas flows, gas pressures and various self-bias voltages wer e investigated by means of different diagnostic methods. The thickness , stress in thin films, hardness, composition and optical properties o f deposited thin films were determined.