DEPOSITION AND HYDROGEN CONTENT OF CARBON-FILMS GROWN BY CH3-BEAM BOMBARDMENT( ION)

Carbon deposition and hydrogen codeposition is investigated as a funct ion of ion energy, fluence, and target temperature at normal incidence by bombardment of silicon and pyrolitic graphite substrates with mass selected CH3+ molecules. An amorphous hydrogenated carbon layer (a-C: H) is formed in a thickness range of 40-130 nm at a fluence of 3x10(18 )/cm(2). The deposition process, the re-erosion phenomenon, the hydrog en content, and the WC ratios of the carbon films are studied between 300 and 1000 K in the ion energy range from 150 eV to 3 keV. The exper imental results are compared with those of TRIDYN computer simulations and previous experimental results of carbon sputtering by atomic H+ a nd C+ beams in order to obtain a better understanding of the interacti on between hydrocarbon ions and the carbon-based wall materials in fus ion devices. (C) 1995 American Institute of Physics.