THE TEMPERATURE-DEPENDENCE OF MAGNETIC-ANISOTROPY IN ULTRA-THIN FILMS

Citation
M. Farle et al., THE TEMPERATURE-DEPENDENCE OF MAGNETIC-ANISOTROPY IN ULTRA-THIN FILMS, Journal of magnetism and magnetic materials, 165(1-3), 1997, pp. 74-77
Citations number
23
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
03048853
Volume
165
Issue
1-3
Year of publication
1997
Pages
74 - 77
Database
ISI
SICI code
0304-8853(1997)165:1-3<74:TTOMIU>2.0.ZU;2-2
Abstract
Results for the reorientation of the magnetization in 7.6 ML Ni(001)/C u(001) as a function of temperature T are presented. The magnetocrysta lline anisotropy coefficients up to fourth order are determined by in situ UHV ferromagnetic resonance. The angle theta(eq) of the spontaneo us magnetization measured from the film normal is found to change cont inuously from 90 degrees at 200 K, i.e. in-plane, to 16 degrees at 250 K, to 0 degrees above 300 K. The unique reorientation of the magnetiz ation to a perpendicular direction above a critical temperature T-R is described quantitatively by the temperature dependence of the volume and interface anisotropy contributions K-2(V) and K-2(S) which were al so measured. This is compared with the case of Gd(0001)/W(110) and Ni( 111)/W(110). One finds that there is no universal behavior for the tem perature dependence of K-2(V) and K-2(S) the case of Ni, the behavior of K-2(V) is well described by a magnetoelastic model which uses only the temperature dependence of the elastic and magnetostrictive constan ts of bulk Ni and the lattice mismatch to the substrate.