SURFACE ELECTRONIC AND ATOMIC-STRUCTURE OF ERSI1.7 ON SI(111)

Citation
L. Stauffer et al., SURFACE ELECTRONIC AND ATOMIC-STRUCTURE OF ERSI1.7 ON SI(111), Physical review. B, Condensed matter, 52(16), 1995, pp. 11932-11937
Citations number
23
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
52
Issue
16
Year of publication
1995
Pages
11932 - 11937
Database
ISI
SICI code
0163-1829(1995)52:16<11932:SEAAOE>2.0.ZU;2-L
Abstract
The surface atomic and electronic structure of ErSi1.7 layers epitaxia lly grown on Si(111) is studied by angle-resolved ultraviolet photoemi ssion spectroscopy. The experimental results are compared to electroni c band-structure calculations for various reasonable surface atomic co nfigurations. Satisfactory agreement is obtained for two geometries co nsisting of reconstructed ErSi1.7 (0001) surfaces. Both reconstruction s involve a buckled Si top layer similar to (111) double layers in bul k Si but differ in their registries with respect to the bulk silicide layer underneath, leading to a silicide surface termination with ErSi1 .7 stoichiometry. In contrast, the calculations clearly show that a su rface termination with ErSi1.7 stoichiometry involving an ordered arra y of vacancies in the buckled Si top layer would result in a quite dif ferent surface electronic structure incompatible with the experimental one. This allows us to rule out this model often invoked in previous work. Finally, models exposing a bulklike flat Si graphitelike top lay er, with or without vacancies, can also safely be ruled out on the bas is of the present data.