OBSERVATION OF THE FORMATION OF A CARBON-RICH SURFACE-LAYER IN SILICON

Citation
Hj. Osten et al., OBSERVATION OF THE FORMATION OF A CARBON-RICH SURFACE-LAYER IN SILICON, Physical review. B, Condensed matter, 52(16), 1995, pp. 12179-12183
Citations number
24
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
52
Issue
16
Year of publication
1995
Pages
12179 - 12183
Database
ISI
SICI code
0163-1829(1995)52:16<12179:OOTFOA>2.0.ZU;2-X
Abstract
Due to its small size, the carbon atom has a very low solubility in a silicon crystal. In spite of this, we show that carbon atoms adsorbed on top of a silicon surface readily migrate into substitutional sites below the surface, leading to a narrow layer of a highly concentrated alloy. This was demonstrated by depositing carbon on a Si (001) surfac e by molecular beam epitaxy and investigating the changes in the chemi cal environment by x-ray photoelectron spectroscopy during successive annealing steps at increasing temperatures. Ab initio total-energy cal culations were used to interpret the measured spectra.