Vy. Kashirin et al., PECULIARITIES OF ELECTRONIC-PROPERTIES OF DELTA[SB] LAYERS IN EPITAXIAL SI .2. EFFECTS OF WEAK-LOCALIZATION AND ELECTRON-ELECTRON INTERACTION, Fizika nizkih temperatur, 22(10), 1996, pp. 1174-1185
The temperature (from 1.5 to 2 K) and magnetic field (up to 4.5 T) dep
endences of conductivity and Hall's emf have been studied in delta[Sb]
-layers of Si with a different Hall's concentration of charge carriers
. It is shown that these dependences can be described to a high degree
of accuracy by the quantum corrections to Conductivity associated wit
h effects of weak localization of electron and electron-electron inter
action in a two-dimensional system. The temperature dependence of elec
tron phase relaxation time, the spin-orbit interaction time and the pa
rameter lambda(D) of electron-electron interaction have been determine
d. It is found that decreasing concentration of electron in a delta-la
yer involves a decrease in lambda(D) that may be explained by the pecu
liarities of screening processes in a two-dimensional electronic syste
m.