PECULIARITIES OF ELECTRONIC-PROPERTIES OF DELTA[SB] LAYERS IN EPITAXIAL SI .2. EFFECTS OF WEAK-LOCALIZATION AND ELECTRON-ELECTRON INTERACTION

Citation
Vy. Kashirin et al., PECULIARITIES OF ELECTRONIC-PROPERTIES OF DELTA[SB] LAYERS IN EPITAXIAL SI .2. EFFECTS OF WEAK-LOCALIZATION AND ELECTRON-ELECTRON INTERACTION, Fizika nizkih temperatur, 22(10), 1996, pp. 1174-1185
Citations number
23
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
01326414
Volume
22
Issue
10
Year of publication
1996
Pages
1174 - 1185
Database
ISI
SICI code
0132-6414(1996)22:10<1174:POEODL>2.0.ZU;2-3
Abstract
The temperature (from 1.5 to 2 K) and magnetic field (up to 4.5 T) dep endences of conductivity and Hall's emf have been studied in delta[Sb] -layers of Si with a different Hall's concentration of charge carriers . It is shown that these dependences can be described to a high degree of accuracy by the quantum corrections to Conductivity associated wit h effects of weak localization of electron and electron-electron inter action in a two-dimensional system. The temperature dependence of elec tron phase relaxation time, the spin-orbit interaction time and the pa rameter lambda(D) of electron-electron interaction have been determine d. It is found that decreasing concentration of electron in a delta-la yer involves a decrease in lambda(D) that may be explained by the pecu liarities of screening processes in a two-dimensional electronic syste m.