PHOTOLUMINESCENCE OF YTTERBIUM-DOPED POROUS SILICON

Citation
T. Kimura et al., PHOTOLUMINESCENCE OF YTTERBIUM-DOPED POROUS SILICON, Applied physics letters, 67(18), 1995, pp. 2687-2689
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
67
Issue
18
Year of publication
1995
Pages
2687 - 2689
Database
ISI
SICI code
0003-6951(1995)67:18<2687:POYPS>2.0.ZU;2-M
Abstract
Yb3+-related photoluminescence is observed at room temperature from Yb -doped porous silicon layers prepared by the electro-chemical method d eveloped by our group for Er doping of porous silicon layers. After ra pid thermal annealing in a pure argon atmosphere at high temperatures (above similar to 900 degrees C), samples show a sharp photoluminescen ce band at around 1.0 mu m which is assigned to the intrashell 4f-4f t ransitions F-2(5/2) --> F-2(7/2) of Yb3+. The enlarged energy bandgap of silicon as a result of anodization makes possible the excitation of Yb3+ 4f-electrons with the recombination energy of photocarriers gene rated in the host porous silicon layers. (C) 1995 American Institute o f Physics.