We have studied the inhibition of superconductivity in high-temperatur
e superconductors oxide films by aluminum ion implantation. Aluminum i
ons, with doses ranging from 1 X 10(15)-1 X 10(16)/cm(2), were implant
ed into epitaxial YBa2Cu3O7-x (YBCO) films with an injection energy of
100 keV. Doses of 1 X 10(16)/cm(2) completely suppressed the diamagne
tism of the YBCO film without the need for annealing. Lower doses of 1
X 10(15)/cm(2) inhibited the superconductivity after low-temperature
annealing. The results of the aluminum implantation are compared with
previous silicon and baron implantations. (C) 1995 American Institute
of Physics.