CHARACTERISTICS OF PRECIPITATION PROCESSE S AND PROPERTIES OF SILICONLAYERS PREPARED BY JET PLASMA-CHEMICAL TECHNIQUES WITH ELECTRON-BEAM ACTIVATION OF GASES

Authors
SHARAFUTDINOV RG BAKLANOV MR AYUPOV BM BADALYAN AM POLYAKOV OV SKRYTNIKOV AV PARAKHNEVICH AV MOGILNIKOV K BIRYUKOV SV
Citation
Rg. Sharafutdinov et al., CHARACTERISTICS OF PRECIPITATION PROCESSE S AND PROPERTIES OF SILICONLAYERS PREPARED BY JET PLASMA-CHEMICAL TECHNIQUES WITH ELECTRON-BEAM ACTIVATION OF GASES, Zurnal tehniceskoj fiziki, 65(1), 1995, pp. 181-185
Citations number
4
Categorie Soggetti
Physics, Applied
Journal title
Zurnal tehniceskoj fiziki → ACNP
ISSN journal
00444642
Volume
65
Issue
1
Year of publication
1995
Pages
181 - 185
Database
ISI
SICI code
0044-4642(1995)65:1<181:COPPSA>2.0.ZU;2-6