Yn. Borisenko et al., THE USE OF STIMULATED BOUNDARY GAS-RELEASE FOR DETERMINATION OF THE ADHESION OF THIN-FILMS BY THE BLISTER TEST, Journal of adhesion science and technology, 9(11), 1995, pp. 1413-1426
The processes of stimulated gas release and gas blister growth were in
vestigated at the interface of 100 nm thick silver films on glass subs
trates after irradiation by hydrogen ions of 1 MeV energy to fluences
of 1 x 10(13) - 1 x 10(15) ion cm(-2). An interference microscope was
used to examine the gas blisters and to measure the blister parameters
. The relationship of these processes to the adhesion of a thin film s
ystem was established. A method to determine the adhesion and to compu
te the adhesion characteristics in the film-substrate system is descri
bed. The calculated energy of the detachment ranges between 0.06 and 2
8 J m(-2). Based on the results of this study, a series of practical a
pproaches are proposed to measure the adhesion of thin films to substr
ates with the method of stimulated gas release.