PHOTOTHERMAL MEASUREMENTS ON OPTICAL THIN-FILMS

Authors
WELSCH E RISTAU D
Citation
E. Welsch et D. Ristau, PHOTOTHERMAL MEASUREMENTS ON OPTICAL THIN-FILMS, Applied optics, 34(31), 1995, pp. 7239-7253
Citations number
164
Categorie Soggetti
Optics
Journal title
Applied optics → ACNP
ISSN journal
00036935
Volume
34
Issue
31
Year of publication
1995
Pages
7239 - 7253
Database
ISI
SICI code
0003-6935(1995)34:31<7239:PMOOT>2.0.ZU;2-O
Abstract
An overview of the application of the photothermal technique for optic al as well as thermophysical characterizations of thin films is given. The peculiarities of this technique are discussed in some detail, and selected important results are pointed out. Emphasis is placed on the influence of both residual absorption and randomly distributed inhomo geneities in thin films on their laser-damage resistance.