CHEMICAL-DEPOSITION AND CHARACTERIZATION OF SILVER FILMS

Silver films were prepared by employing electroless deposition using a dsorption-reduction mechanism on the glass substrates, in which silver ions were adsorbed on glass surface which were then reduced to metall ic silver in thinfilm form by suitable reducing agent. The preparative parameters like concentration of silver nitrate, temperature of bath, reducing agent, complexing reagent were optimised. These films were c haracterised by structural, electrical and optical measurement techniq ues. The parameters such as electrical resistivity, mobility, carrier concentration, Hall coefficient, thermoelectric power were estimated. The silver films were annealed in vacuum at 200 degrees C for 2 hr in order to study the change in electrical properties.