REAL-TIME MONITORING OF ELECTRON PROCESSORS

Authors
NABLO SV KNEELAND DR MCLAUGHLIN WL
Citation
Sv. Nablo et al., REAL-TIME MONITORING OF ELECTRON PROCESSORS, Radiation physics and chemistry, 46(4-6), 1995, pp. 1377-1383
Citations number
16
Categorie Soggetti
Nuclear Sciences & Tecnology","Chemistry Physical","Physics, Atomic, Molecular & Chemical
Journal title
Radiation physics and chemistry → ACNP
ISSN journal
0969806X
Volume
46
Issue
4-6
Year of publication
1995
Part
2
Pages
1377 - 1383
Database
ISI
SICI code
0969-806X(1995)46:4-6<1377:RMOEP>2.0.ZU;2-U
Abstract
A real time radiation monitor (RTRM(R)) has been developed for monitor ing the dose rate (current density) of electron beam processors. The s ystem provides continuous monitoring of processor output, electron bea m uniformity, and an independent measure of operating voltage or elect ron energy. In view of the device's ability to replace labor-intensive dosimetry in verification of machine performance on a real-time basis , its application to providing archival performance data for in-line p rocessing is discussed.