PREPOLYMER FILM GROWTH BY ADSORPTION OUT OF SOLUTION ON SILICON AND ALUMINUM - AN ATOMIC-FORCE MICROSCOPIC STUDY

A cyanurate prepolymer has been applied to smooth silicon wafers or to distinctly structured aluminium coatings. The surface composition of the substrates has been investigated by X-ray Photoelectron Spectrosco py (XPS), Auger Electron Spectroscopy (AES) and ellipsometry. The appl ication methods, spin coating and dip coating represent adsorption by a technical process exerting significant shear stresses or nearly equi librated conditions, respectively. The mean tickness of the prepolymer film has been adjusted by variation of the concentration of the solut ion and checked by ellipsometry. Atomic Force Microscopy (AFM) monitor ed the development of the respective film morphologies of all 4 system s (silicon/aluminium, spin/dip coating) in the mean film thickness ran ge from 1 to 50 nm.