AFM AND XRD INVESTIGATION OF CRYSTALLINE VAPOR-DEPOSITED C-60 FILMS

The morphological and structural properties of C-60 films deposited on quartz substrates by sublimation at 320-500 degrees C under high vacu um have been investigated using atomic force microscopy (AFM) and refl ection Xray diffraction (RXRD). The thickness of the films varied betw een 0.2 mu m and 10 mu m. AFM showed that the films consist predominan tly of cubic crystals of a few micrometer in size with well-developed (111) and (100) faces. The crystallographic investigation revealed a s trongly preferred [111] growth direction which is very sensitive to th e deposition rate and substrate temperature. The influence of the expe rimental parameters on the morphology of the crystals and on the prefe rred orientation of the films is discussed in view of the AFM and RXRD results.