M. Gastel et al., QUANTITATIVE-DETERMINATION OF ELEMENT DISTRIBUTIONS IN SILICON-BASED THIN-FILM SOLAR-CELLS USING SNMS, Fresenius' journal of analytical chemistry, 353(3-4), 1995, pp. 478-482
The determination of elemental distributions in thin film solar cells
based on amorphous silicon using electron beam SNMS is possible by qua
ntifying the measured ion intensities. The relative sensitivity factor
s (RSFs) for all elements measured have to be known. The RSFs have bee
n determined experimentally using implantation and bulk standards with
known concentrations of the interesting elements. The measured RSFs h
ave been compared with calculated RSFs. The model used for the calcula
tion of the RSFs takes into account the probability for electron impac
t ionization and the dwell time of the neutrals inside the postionizat
ion region. The comparison between measured and calculated RSF shows,
that this model is capable to explain the RSFs for most elements. Diff
erences between calculated and measured values can be explained by the
formation of hydride and fluoride molecules (in case of H and F) and
influences of the angular distribution of the sputtered neutrals in ca
se of Al. The experimentally determined RSFs have been used for a quan
tification of depth profiles of the i-, buffer-, p- and front contact
layers of a-Si solar cells.