INFLUENCE OF GRAIN-SIZE ON THE TRANSPORT-PROPERTIES OF NI80FE20 AND CU THIN-FILMS

Authors
RIJKS TGSM SOUR RLH NEERINCK DG DEVEIRMAN AEM COEHOORN R KOOLS JCS GILLIES MF DEJONGE WJM
Citation
Tgsm. Rijks et al., INFLUENCE OF GRAIN-SIZE ON THE TRANSPORT-PROPERTIES OF NI80FE20 AND CU THIN-FILMS, IEEE transactions on magnetics, 31(6), 1995, pp. 3865-3867
Citations number
13
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
Journal title
IEEE transactions on magnetics → ACNP
ISSN journal
00189464
Volume
31
Issue
6
Year of publication
1995
Part
2
Pages
3865 - 3867
Database
ISI
SICI code
0018-9464(1995)31:6<3865:IOGOTT>2.0.ZU;2-I
Abstract
The conductivity of sputtered Ta/Cu/Ta and Ta/Ni80Fe20/Ta thin films w as measured for a film thickness ranging from 20 to 1500 Angstrom. The measured data were analyzed using a semi-classical model for the elec tron transport, that includes grain boundary scattering. It was found that in these films grain boundaries are an important source of electr on scattering, in Ni80Fe20 leading to an effective spin dependence of the scattering which is considerably smaller than the intrinsic spin d ependence of the scattering.