CLUSTER BEAMS FOR METALLIZATION OF MICROSTRUCTURED SURFACES

Authors
Citation
P. Gatz et Of. Hagena, CLUSTER BEAMS FOR METALLIZATION OF MICROSTRUCTURED SURFACES, Applied surface science, 91(1-4), 1995, pp. 169-174
Citations number
11
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
91
Issue
1-4
Year of publication
1995
Pages
169 - 174
Database
ISI
SICI code
0169-4332(1995)91:1-4<169:CBFMOM>2.0.ZU;2-A
Abstract
Cluster beams from a nozzle source are characterized by a high directi onality (point source) and a high intensity. These properties have bee n used for thin film metallization of flat and microstructured surface s. The paper describes the cluster beam source developed for metals li ke silver and magnesium. At present, the final collimated cluster beam covers a total angle of 7 degrees, which for a source distance of 1 m gives a beam diameter of 120 mm. The deposition rate at that distance is up to 10 nm/s, and the total beam flux is 20% of the metal flux ou t of the nozzle. The metallic films obtained with this new deposition technique are a close image of the respective substrate structure. Goo d metallization of substrates has been observed up to cluster incidenc e angles of 80 degrees, and the negligible thermal divergence of the c luster beam allows metal deposition, e.g. into contact holes.