TI NITRIDE PHASES IN THIN-FILMS DEPOSITED BY DC MAGNETRON SPUTTERING

Authors
MANAILA R BIRO D BARNA PB ADAMIK M ZAVALICHE F CRACIUN S DEVENYI A
Citation
R. Manaila et al., TI NITRIDE PHASES IN THIN-FILMS DEPOSITED BY DC MAGNETRON SPUTTERING, Applied surface science, 91(1-4), 1995, pp. 295-302
Citations number
8
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
91
Issue
1-4
Year of publication
1995
Pages
295 - 302
Database
ISI
SICI code
0169-4332(1995)91:1-4<295:TNPITD>2.0.ZU;2-C
Abstract
Ti nitride films were deposited by DC magnetron sputtering on HSS and Si substrates. X-ray diffraction showed the formation of single-phase delta-TiN. (111) texture was found in most films, as well as stacking disorder on (111) planes, both correlated with deposition parameters, including the degree of plasma ionization. Evidence was found for plas tic deformation relaxing film stress, The structure data are correlate d with film microstructure and microhardness.