F. Jonckx et al., ON THE FORMATION OF SILICIDES ON POLY RUNNERS WITH TOPOGRAPHY BY A 2-STEP SILICIDATION PROCESS, Applied surface science, 91(1-4), 1995, pp. 378-381
Citations number
5
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
The formation of titanium and cobalt silicide on poly runners with top
ography is studied in this work. Poly runners with various topography
heights and slopes were silicided by a two-step salicide process and i
nspected by SEM and electrical measurements. Even though the topograph
y was more severe than in current PBLOCOS processes, no electrical def
ects in the continuity of the silicide were observed. Cross-section SE
M reveals, however, that the metal coverage on the steps plays a major
role in the continuity of the silicide formed.