ON THE FORMATION OF SILICIDES ON POLY RUNNERS WITH TOPOGRAPHY BY A 2-STEP SILICIDATION PROCESS

Citation
F. Jonckx et al., ON THE FORMATION OF SILICIDES ON POLY RUNNERS WITH TOPOGRAPHY BY A 2-STEP SILICIDATION PROCESS, Applied surface science, 91(1-4), 1995, pp. 378-381
Citations number
5
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
91
Issue
1-4
Year of publication
1995
Pages
378 - 381
Database
ISI
SICI code
0169-4332(1995)91:1-4<378:OTFOSO>2.0.ZU;2-Z
Abstract
The formation of titanium and cobalt silicide on poly runners with top ography is studied in this work. Poly runners with various topography heights and slopes were silicided by a two-step salicide process and i nspected by SEM and electrical measurements. Even though the topograph y was more severe than in current PBLOCOS processes, no electrical def ects in the continuity of the silicide were observed. Cross-section SE M reveals, however, that the metal coverage on the steps plays a major role in the continuity of the silicide formed.