THE ILU-8TP SYSTEM FOR THICK-FILM PASTE CURING BY MEANS OF ELECTRON-BEAM

Authors
AUSLENDER VL GORBUNOV VA GORBUNOVA NA
Citation
Vl. Auslender et al., THE ILU-8TP SYSTEM FOR THICK-FILM PASTE CURING BY MEANS OF ELECTRON-BEAM, Radiation physics and chemistry, 46(4-6), 1995, pp. 461-463
Citations number
NO
Categorie Soggetti
Nuclear Sciences & Tecnology","Chemistry Physical","Physics, Atomic, Molecular & Chemical
Journal title
Radiation physics and chemistry → ACNP
ISSN journal
0969806X
Volume
46
Issue
4-6
Year of publication
1995
Part
1
Pages
461 - 463
Database
ISI
SICI code
0969-806X(1995)46:4-6<461:TISFTP>2.0.ZU;2-E
Abstract
ILU-8TP system was designed for electron beam curing of thick-film pas tes in the frame of screen- and-fire technological process of producti on of hybrid integrated circuits (HIC). It comprises electron accelera tor ILU-8 (electron beam energy 1 MeV, power 20 kW), X-ray shielding, three internal conveyors and associate support devices. The system cle ans plates, dries and hardens thick-film coating, trims resistors. Ele ctron beam treatment process lasts 40-60 seconds with maximum temperat ure of 1000 centigrades. Maximum productivity of ILU-8TP is 3000 plate s per hour. Usage of ILU-8TP instead of baking oven permits to improve quality of thick-film components.