M. Tamba et al., THIYL-RADICALS AND THIYL-PEROXYL RADICALS PRODUCED FROM THE IRRADIATION OF ANTIOXIDANT THIOL COMPOUNDS, Radiation physics and chemistry, 46(4-6), 1995, pp. 569-574
Citations number
12
Categorie Soggetti
Nuclear Sciences & Tecnology","Chemistry Physical","Physics, Atomic, Molecular & Chemical
The transients involved in the mechanism of protection by thiol compou
nds against oxidative damage have been characterized by pulse radiolys
is technique. The oxidizing properties of both thiyl (RS .) and thiyl-
peroxyl radical (RSOO .), with E lying in the range +0.9 to +1.0 V, ar
e well emphasized from the rates for their interactions with nucleophi
lic agents, including naturally occurring antioxidants. By applying a
plausible kinetic treatment to the decay pattern of RSOO ., the rates
for both the interaction of the radical with the parent thiol and the
structural rearrangement to sulphonyl radical (RSO(2) .) were measured
to be 1.4 x 10(6) mol(-1)dm(3)s(-1) and 1.4 x 10(3)s(-1), respectivel
y. The roles of thiol-derived radicals in oxidative damage in biologic
al systems are discussed.